Equipment - Physics Facility
 |
||
PHYSICS |
||
 |
||
Laurell WS-400A 6NPP/Lite
Description: The Laurell Spinner is used to manually apply photoresists and PMMA to most substrates. Centrifugal force spreads fluid across the surface of the spinning substrate. The spin speed, spin time, and substrate and fluid properties determine the final thickness of the film.
Features:
- Programmable spin speed, acceleration rate, time, up to 51 steps per recipe. Auto or manual recipe increment.
- Interchangeable vacuum chuck allows processing of wafer fragments, photomasks, substrates of unusual size or shape up to 6"
- No polyimides or LOL are allowed
