Equipment - Physics Facility
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PHYSICS |
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STS 310PC PECVD
Description: The PECVD STS deposition tool is used for depositing silicon nitride and silicon dioxide films. The system is equipped with 13.56 MHz and 187.5 kHz frequencies and is capable of mixed frequency recipes. The temperature of the system is normally kept at 300 °C. Therefore, only the materials that are stable at these temperatures are allowed in the STS deposition system. Please make sure you wear only latex gloves when you are working with this system. No vinyl gloves. Use only clean METAL tweezers. You can process 4 of 4" wafers at a time. Only Staff Approved materials may be introduced to this system. Notify UFNF Staff 3 hours prior to intended use. Please make sure that you fill out the run sheet located in the binder next to the computer monitor. Record each process executed and the estimated total film thickness for each recipe.
Prerequisites for operating the STS PECVD Tool:
- Read and understand the STS Operation Manual. Only hard copy is available at this time and is located at the machine.
- Receive “one on one” training and certification from UFNF Staff. A Recipe for your Process will be created at that time.
- Obtain a UFNF ID (if you do not already have one) by completing the UFNF Lab Use Request Form.
