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Art Hebard
- Research in the laboratory is focused on the fabrication and characterization of thin-film structures and is based on the recognition that unusual physical phenomena occur in restricted dimensions. Systems under study include metals, composites, semiconductors, dielectrics, superconductors, and carbon-sixty molecular monolayers. Thin-film deposition is accomplished by the vacuum techniques of thermal sublimation by resistive heating, reactive ion beam sputter deposition, electron beam melting and dc/rf sputtering. Characterization techniques available in the laboratory include tunneling, dielectric spectroscopy (10 mHz- 30MHz), atomic force microscopy, electrostatic force microscopy, ellipsometry, and electrical transport at high fields (7T) and over a broad temperature range (1.4-400 K). A unique capability (SHIVA, Sample Handling In VAcuum) has also been developed. This capability allows the monitoring of the optical and electrical properties of thin films as they are being deposited followed by a post-deposition transfer (without exposure to air) of the completed film structure into a low temperature cryostat for magneto-transport measurements.

 
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