Art Hebard - Research in the laboratory
is focused on the fabrication and characterization of thin-film structures
and is based on the recognition that unusual physical phenomena occur
in restricted dimensions. Systems under study include metals, composites,
semiconductors, dielectrics, superconductors, and carbon-sixty molecular
monolayers. Thin-film deposition is accomplished by the vacuum techniques
of thermal sublimation by resistive heating, reactive ion beam sputter
deposition, electron beam melting and dc/rf sputtering. Characterization
techniques available in the laboratory include tunneling, dielectric
spectroscopy (10 mHz- 30MHz), atomic force microscopy, electrostatic
force microscopy, ellipsometry, and electrical transport at high fields
(7T) and over a broad temperature range (1.4-400 K). A unique capability
(SHIVA, Sample Handling In VAcuum) has also been developed. This capability
allows the monitoring of the optical and electrical properties of thin
films as they are being deposited followed by a post-deposition transfer
(without exposure to air) of the completed film structure into a low
temperature cryostat for magneto-transport measurements.